Atomic deposition coating system: the key to multi-field innovation

Atomic deposition coating system has become the core equipment of technical breakthrough in many fields by virtue of atomic precision control and excellent conformal property. 

In the field of semiconductor, it prepares ultra-thin insulation layer for chips, and the control accuracy of 5nm film thickness reaches ±0.2nm, which helps the density of memory chips to exceed 1Tb per square inch, meeting the requirements of chip miniaturization and high performance.

In the field of new energy, by coating the lithium battery material, the capacity of the battery is reduced by less than 10% after 2000 cycles, and the powder coating equipment supports 100 kg mass production, which promotes the performance upgrade of the power battery. In the field of optics, the prepared multilayer optical film can improve the lens transmittance to 99%, and it can run stably at extreme temperatures, thus improving the imaging quality of optical equipment. In addition, in the fields of sensors, medical devices, etc., it can also provide uniform and wear-resistant films, which will inject impetus into innovation in various industries.