Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.Welcome your contact and visit!
Customized Film Evaporators
Pudi support customized equipments relatedvacuum,like Mask,Chamber,Vacuum interconnection system,Carbon Film Systemm,Tube Ovens,Crystal Pulling Ovens,Annealing furnace,Arc Melting Furnace and Other Custom Vacuum Solutions.
CONTACT PUDI FOR PROFESSIONAL HELP
PUDI team of engineers,chemists,and designers will help you choose the best tools for your process and material requrements,and will ensure you get the right configuration.We offer support and can customize your system for film thickness uniformity,film structure and material utilization.Also welcome you taking or express us your samples with requirments to do test in PUDI Lab.
PUDI PRODUCTS
We continuously improve our products and service.The main products mainly include PVD evaporation coating equipment (including resistance, electron beam, induction evaporation and other forms), PVD magnetron sputtering coating equipment (developed many standard equipment and production line continuous splash system), PVP ion plating multifunctional coating equipment, plasma cleaning machine / rubber machine, CVD microwave / DC plasma injection / hot wire chemical vapor deposition system, ALD and vacuum Chamber tailor-make / vacuum environment simulation equipment custom system.
Thermal Vacuum Evaporator
Metal and organic thin film materials Deposit metals (Au, Ag, Al, Ca, Cu, Mg, Fe, Cr, Ni, etc.), non-metals, compounds
Metal materials such as aluminum, titanium, zirconium, chromium, nickel, iron, etc. Oxide materials such as alumina, silicon oxide, titanium oxide Semiconductor materials: such as silicon, germanium
To remove of contaminants from surfaces before they can be used in the manufacturing process.Plasma cleaning can be applied to an array of materials along with surfaces with complex geometries.
