The 2025 Annual Conference on Microsystems And Nanoengineering Successfully Concluded on October 17th.

         On the first day of the conference, the venue was bustling with a vibrant and energetic atmosphere.

         Experts, scholars, and industry representatives from around the world in the field of micro-nano technology gathered together, united by their passion and spirit of exploration. They arrived at the venue early, their faces glowing with anticipation.

          At 8:30 AM on October 16th, the guest speeches and keynote presentations commenced. The session highlighted the achievements of the conference over the past decade and established an excellent platform for academic exchange and collaboration with world-leading experts.The conference brought together leading global scientists in the micro-nano field, fostering in-depth discussions and advancing the development of micro-nano technology.The presentations also outlined the key themes of the conference, including the Young Scientists Salon and the MINE Editorial Board Meeting.Additionally, the conference featured multiple specialized workshops, such as the Micro-Nano Symposium, Advanced    Sample Preparation, the MEMS Experts Workshop, and the Next-Generation Micromachining and Nanofabrication Symposium,providing a rich platform for researchers in micro-nano technology to exchange ideas and insights.

          For this exhibition, PDVACUUM meticulously designed its booth with a simple yet elegant layout that exudes a sense of technological sophistication.The booth primarily features a blue color scheme, symbolizing technology and the future.Around the booth, promotional materials and product models are displayed, allowing visitors to easily learn about the company's products and technologies.

          At the booth, PDVACUUM staff enthusiastically introduced the performance and application scenarios of the equipment to visitors, engaging in in-depth exchanges and communication with them.The PD-150Q Plasma Cleaning Machine brought to the event attracted particular attention.Its distinctive appearance and potential performance advantages prompted many visitors to pause in front of the booth, carefully observing the device and seeking to learn more about its features.

          PD-150Q Plasma Cleaning Machine

          This equipment offers multiple advantages: it is compact in size, easy to operate, delivers remarkable cleaning performance, and requires minimal processing time. As such, it is particularly suitable for laboratory use in processing materials such as silicon wafers and glass.It effectively removes impurities from material surfaces, including organic residues, inorganic contaminants, and oxides, thereby revealing a pristine, clean interface of the original material.

         External Dimensions: L525 × W400 × H400 mm

         Chamber Volume: L150 × W150 × H200 mm

         Cleaning Area Dimensions: 120 × 120 mm