ALD Atomic Layer Deposition System ALD-100 6Inch Substrate

   Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services. 

For ALD, Atomic Layer Deposition System the typical models including ALD-100  ALD-200

Specifications:

Vacuum chamber 4-inch sample deposition reaction chamber, sample temperature can be heated to 150℃, temperature control accuracy ±0.5℃ Precursor source configuration 3 precursor sources, 2 heated metal precursor sources and 1 normal temperature water precursor source for sputtering Size substrate substrate 2-4 inches

Applications:

High-K gate insulation layer, OLED packaging layer, solar cell passivation layer, lithium-ion battery, optical component coating, MEMS, etc.

Features:

Equipped with a high-performance thin film vacuum gauge and an atmospheric pressure detection vacuum gauge, pressure changes during the ALD process can be observed in real time.

Automatic control software, with CDA alarm and hardware protection functions against temperature runaway, ensuring the safety of the ALD process.

Deposition materials: HfO2, ZrO2, SnO2, Al203, ZnO, TiO2, etc., deposited film non-uniformity <±2%

Available Typical Models

ALD-100 for 6inch 100x100mm samples

ALD-200 for 8inch 210x210mm samples

Contact Us