ALD Atomic Layer Deposition System ALD-200D Dual Chambers

   Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services. 

For ALD, Atomic Layer Deposition System with dual chambers Thermal Type ALD-200D 

Specifications:

Sample stage 8-inch sample stage dual-chamber reaction chamber, compatible with 210×210 mm square samples, sample stage space height 100mm;Deposition non-uniformity: Non-uniformity of 50nm aluminum oxide deposited within 8 inches <±1%;Precursor source: equipped with 6 precursor sources: 4 heated metal sources, 1 water precursor source and 1 ozone precursor source;Heating uniformity: The sample temperature can be heated to 400℃, the spatial temperature uniformity of the reaction area is ≤±2℃@200℃, and the temperature control accuracy is ±0.5℃

Applications:

oxide films and nitride films, for the preparation of semiconductor films and optoelectronic devices, as well as the research and application of nanostructured materials.

Features:

Equipped with independent high-performance MKS vacuum gauges, can observe the pressure status between the inside and outside during the ALD process in real time.

Automatic control software, easy to operate; with CDA alarm and anti-temperature runaway hardware protection functions to ensure the safety of the ALD process

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