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Electron Beam Evaporation Coating Machine PD-600

PD-600  is configured with a multi-crucible electron beam evaporation source can be selected with multiple groups of resistance evaporation source, can be evaporated in the substrate deposition metal, semiconductor or dielectric materials
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  • PD-600

  • PUDI VACUUM

  • 8419899090-3

   Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.

 

    PD-600 the electron beam equipment can be used to vaporize oxides or metals with electron gun and steam resistance; It can be used in research institutes and universities to prepare conductive film, optical film, semiconductor film, ferroelectric film and the mass production of enterprises.

More about PUDI VACUUM PD-600

NamePD-600 Electron Beam evaporation Coater
Vacuum chamberCylindrical vacuum chamber, made of 304 stainless steel, inner diameter 600mm, height 650-800mm, front door, two observation Windows.
High vacuum pumpDomestic molecular pump or cryogenic pump is optional;

Ultimate vacuum is better than 5x10-5Pa, pumped from the atmosphere to 8 x10-4Pa≤30 minutes.
Electron Gun270 degree E-gun
Porous crucible electron guns, such as 4x25cc, 6x25cc, 8x25cc, or ring crucible (150cc or 300cc), crucible sizes can be customized.
10KW or 15KW high voltage power supply with adjustable high voltage output of 6-10KV.
Evaporation sourceUsing resistance heating evaporation; Can be equipped with 2 groups of sources.
Evaporation rate and film thicknessInficon SQC-310 quartz crystal film thickness controller to control evaporation rate and film thickness.
Ion SourceHall source/RF ion source optional.Used for substrate pre-cleaning and can also be used for ion assisted deposition.
Intake air controlFlowmeter maximum flow optional, can be configured with multiple air intake.
Heating controlQuartz lamp sets heat up to 200-300 degrees
Work holderPlanetary work holder, four 6-8 inch diameter planetary disks, revolution + rotation, adjustable speed.

Dome type/automatic tilting/plate type work frame is optional
Control systemSiemens PLC+ PC automatic control
ManufacturerPUDI VACUUM

Contact US

Manufacturer Full NameWUHAN PUDI VACUUM TECHNOLOGY CO.,LTD
Organisational Credit Number VA91420100MA4KN2CF2B
Email:helen@pdvacuum.com ;   zyw@pdvacuum.com
Tel:0086 27 81293223  
WECHAT/WHATSAPP:0086 13129990512


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CONTACT US

Add : #18-1, Donghu High-tech Industrial Innovation Base, No.9, Miaoshan Avenue, Jiangxia District, Wuhan city,China
Phone : +86-131-2999-0512
E-mail :  helen@pdvacuum.com
Skype : etangfei
PUDI VACUUM 

CONTACT US

    Add : #18-1, Donghu High-tech Industrial Innovation Base, No.9, Miaoshan 
    Phone : +86-131-2999-0512
       Wechat/Whatsapp:0086 13129990512
    E-mail : helen@pdvacuum.com
    Skype : etangfei
Copyright  2024 PUDI VACUUM Technology Co., Ltd. All Rights Reserved.