RF Plasma Cleaner PD-600Q

PUDIVAC RF Plasma Cleaner

Pudi Vacuum offers three RF plasma cleaning systems, designed to accommodate different sample sizes for versatile applications in semiconductors, optics, medical devices, and material science.

Available Models:

1. PD-150Q

• Max Sample Size: 120 × 120 mm

• Ideal for: Small-scale R&D, precision components, and lab testing.

2. PD-300Q

• Max Sample Size: 260 × 260 mm

• Ideal for: Medium-sized substrates, industrial prototyping, and batch processing.

3. PD-600Q

• Max Sample Size: 500 × 500 mm

• Ideal for: Large panels, production-scale cleaning, and high-throughput applications.

Key Features (Common to All Models):

• RF Frequency: 13.56 MHz (industry-standard) for stable plasma generation.

• Multi-gas Compatibility: Supports O₂, Ar, N₂, CF₄, and other process gases.

• Uniform Cleaning: Optimized electrode design for consistent surface treatment.

• User-Friendly Interface: Programmable controls for power, time, and gas flow.

Applications:

• Decontamination of organic residues, oxide removal, and surface activation.

• Suitable for wafers, glass, metals, polymers, and 3D-structured components.

Why Choose Pudi Vacuum?

✔ Scalability – From R&D to full production.
✔ Reliability – Robust vacuum and RF systems for long-term performance.
✔ Customization – Optional upgrades (ICP source, automation integration).

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