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The system PD-450CS series magnetron sputtering coating equipment is equipped with a number of circular plane targets or rectangular plane targets, using DC, DC pulse, RF power supply,substrate size up to 300mm,integrated glovebox
| Quantity: | |
|---|---|
PD-450CS
PUDI
8419899090-10
Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.
For Magnetrn Sputtering Coater,the typical models including:
| Model | PD-200C | PD-300C | PD-400C | PD-500C | PD-600C | PD-450CS | PD-550CS |
| Application | Widely used in scientific research institutes and laboratories to prepare metal electrode layers, sample preparation for scanning electron microscopy, and research on new organic materials and new processes related to new energy materials. It is used in the research and development of perovskite solar cells, OLED, lithium batteries, quantum dot LED, OPV and other industries, and can prepare ITO oxide, nitride, metal and other thin film materials. At the same time, it is also suitable for multi-material research such as metals, semiconductors, nanotechnology and insulators. | ||||||
| Materials | Metal materials such as aluminum, titanium, zirconium, chromium, nickel, iron, etc. Oxide materials such as alumina, silicon oxide, titanium oxide Semiconductor materials: such as silicon, germanium, etc. | ||||||
| Device Size (L×W×H) | 500×500×600mm | 550×900×1850mm | 850×1500×1900mm | 1450×1250×1850mm | 2200×1700×2200mm | 1500×850×1900mm | 1500×850×1900mm |
| chamber Size(L×W×H) | Φ220×H340mm Cylindrical | 300×300×380mm | 400×400×380mm | 500×500×500mm | 600×600×500mm | 440×440×450mm | 500×440×450mm |
| Ultimate Vacuum | 6×10-5Pa | 7×10-5Pa | 3×10-5Pa | 3×10-5Pa | 3×10-7Pa | 5×10-5Pa | 5×10-5Pa |
| Pumping speed | 6×10-4Pa≤20min | 8×10-4Pa≤35min | 8×10-4Pa≤30min | 8×10-4Pa≤35min | 5×10-6Pa≤30min | 9×10-4Pa≤35min | 9×10-4Pa≤35min |
| Keep pressure | 12H≤8pa | 12H≤8pa | 12H≤8pa | 12H≤5pa | 12H≤5pa | 12H≤5pa | 12H≤5pa |
| Unifimity | Better than ±5％ | ||||||
| Sputter target gun | 2-3inch target gun 1pc | 2-3inch target gun 2pcs | 2-3inch target gun 3pcs | 2-3 inch target gun 4pcs | 2-3 inch target gun 4pcs | Rectangular targets L365mm x W75mm 2pcs | Rectangular targets L450mm x W75mm 2pcs |
| Substrate Size | 2-3INCH | 2-4INCH | 2-4INCH | 2-6INCH | 2-6INCH | 200×200mm | 250×250mm |
| Control system | Siemens PLC + PC automatic control; the speed and final thickness can be input, and PID adjustment automatically controls the evaporation power output. | ||||||
Product Overview:
This series of equipment for perovskite solar cells, OLED, lithium batteries, quantum dot LED, OPV and other industries research and development special equipment, equipment can process the preparation of nano-oxide, nitride, metal and other thin film materials. The sputtering system is connected with the glove box system to realize the whole preparation process in the environment of anhydrous and oxygen-free glove box. PVD and Glove box hardware seamless docking, control integration, the test sample in the vacuum glove box environment to complete the spinning coating, sputtering, testing and other processes.
Equipment Features:
★ The front door of the sputtering equipment is embedded in the glove box, the current door slides open, and the evaporation equipment studio and the glove box operation room are integrated, so there is no need to transfer the test sample with the help of transfer tools or air breaking;
★ The sputtering chamber is made of SUS 304 stainless steel material, and the surface of the chamber including the shielding plate is all mirror polished, which can obtain a clean working environment and good vacuum degree;
★ Vacuum obtained by using large pumping speed molecular pump + direct rotary vane pump (built-in anti-return oil check valve) quasi-oil-free vacuum system, the main pump using 1200L/s pumping speed compound molecular pump, standard side pumping structure, can keep the main pump open the vacuum chamber;
★ Sputtering chamber vacuum limit is better than 2.0×10-5Pa, 1 ~ 2h can be pumped to 9.9×10-5Pa;
★ Sputtering target "product" shape can be equipped with 2-3 inches (2-3 targets) equipped with independent baffles;
★ Sputtering power supply; 2-3 sets (DC, RF optional);
★ The system can be selected with low pressure sputtering technology to prepare dense film and small damage to the base.
★ Control system: Siemens PLC+ touch screen, program interlock, anti-misoperation, easy to learn.
Technical Support & Service
1.Technical support: Before the contract is signed, our professional engineers will make the best selection and program design for customers under the premise of fully understanding customer needs, so that customers fully understand and understand product technical indicators, performance purposes, use occasions, safety precautions, etc., to help customers make the right choice.
2.Installation and training: Before the product is used, we will send professional engineers to provide you with on-site technical support, training and demonstration services.
3.Product warranty: We provide a 12-month warranty period for the product. During the warranty period, the company is responsible for compensation or free repair of equipment or accessories damage. (Except consumables and consumable parts)
4.Lifelong maintenance: We provide lifelong service to the products, for more than the warranty period of repair, maintenance only charge material fees, exempt from all labor costs.
Contact Us
| Manufacturer Full Name | WUHAN PUDI VACUUM TECHNOLOGY CO.,LTD |
| Organisational Credit Number | VA91420100MA4KN2CF2B |
| Email: | helen@pdvacuum.com ; zyw@pdvacuum.com |
| Tel: | 0086 27 81293223 |
| WECHAT/WHATSAPP: | 0086 13129990512 |
Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.
For Magnetrn Sputtering Coater,the typical models including:
| Model | PD-200C | PD-300C | PD-400C | PD-500C | PD-600C | PD-450CS | PD-550CS |
| Application | Widely used in scientific research institutes and laboratories to prepare metal electrode layers, sample preparation for scanning electron microscopy, and research on new organic materials and new processes related to new energy materials. It is used in the research and development of perovskite solar cells, OLED, lithium batteries, quantum dot LED, OPV and other industries, and can prepare ITO oxide, nitride, metal and other thin film materials. At the same time, it is also suitable for multi-material research such as metals, semiconductors, nanotechnology and insulators. | ||||||
| Materials | Metal materials such as aluminum, titanium, zirconium, chromium, nickel, iron, etc. Oxide materials such as alumina, silicon oxide, titanium oxide Semiconductor materials: such as silicon, germanium, etc. | ||||||
| Device Size (L×W×H) | 500×500×600mm | 550×900×1850mm | 850×1500×1900mm | 1450×1250×1850mm | 2200×1700×2200mm | 1500×850×1900mm | 1500×850×1900mm |
| chamber Size(L×W×H) | Φ220×H340mm Cylindrical | 300×300×380mm | 400×400×380mm | 500×500×500mm | 600×600×500mm | 440×440×450mm | 500×440×450mm |
| Ultimate Vacuum | 6×10-5Pa | 7×10-5Pa | 3×10-5Pa | 3×10-5Pa | 3×10-7Pa | 5×10-5Pa | 5×10-5Pa |
| Pumping speed | 6×10-4Pa≤20min | 8×10-4Pa≤35min | 8×10-4Pa≤30min | 8×10-4Pa≤35min | 5×10-6Pa≤30min | 9×10-4Pa≤35min | 9×10-4Pa≤35min |
| Keep pressure | 12H≤8pa | 12H≤8pa | 12H≤8pa | 12H≤5pa | 12H≤5pa | 12H≤5pa | 12H≤5pa |
| Unifimity | Better than ±5％ | ||||||
| Sputter target gun | 2-3inch target gun 1pc | 2-3inch target gun 2pcs | 2-3inch target gun 3pcs | 2-3 inch target gun 4pcs | 2-3 inch target gun 4pcs | Rectangular targets L365mm x W75mm 2pcs | Rectangular targets L450mm x W75mm 2pcs |
| Substrate Size | 2-3INCH | 2-4INCH | 2-4INCH | 2-6INCH | 2-6INCH | 200×200mm | 250×250mm |
| Control system | Siemens PLC + PC automatic control; the speed and final thickness can be input, and PID adjustment automatically controls the evaporation power output. | ||||||
Product Overview:
This series of equipment for perovskite solar cells, OLED, lithium batteries, quantum dot LED, OPV and other industries research and development special equipment, equipment can process the preparation of nano-oxide, nitride, metal and other thin film materials. The sputtering system is connected with the glove box system to realize the whole preparation process in the environment of anhydrous and oxygen-free glove box. PVD and Glove box hardware seamless docking, control integration, the test sample in the vacuum glove box environment to complete the spinning coating, sputtering, testing and other processes.
Equipment Features:
★ The front door of the sputtering equipment is embedded in the glove box, the current door slides open, and the evaporation equipment studio and the glove box operation room are integrated, so there is no need to transfer the test sample with the help of transfer tools or air breaking;
★ The sputtering chamber is made of SUS 304 stainless steel material, and the surface of the chamber including the shielding plate is all mirror polished, which can obtain a clean working environment and good vacuum degree;
★ Vacuum obtained by using large pumping speed molecular pump + direct rotary vane pump (built-in anti-return oil check valve) quasi-oil-free vacuum system, the main pump using 1200L/s pumping speed compound molecular pump, standard side pumping structure, can keep the main pump open the vacuum chamber;
★ Sputtering chamber vacuum limit is better than 2.0×10-5Pa, 1 ~ 2h can be pumped to 9.9×10-5Pa;
★ Sputtering target "product" shape can be equipped with 2-3 inches (2-3 targets) equipped with independent baffles;
★ Sputtering power supply; 2-3 sets (DC, RF optional);
★ The system can be selected with low pressure sputtering technology to prepare dense film and small damage to the base.
★ Control system: Siemens PLC+ touch screen, program interlock, anti-misoperation, easy to learn.
Technical Support & Service
1.Technical support: Before the contract is signed, our professional engineers will make the best selection and program design for customers under the premise of fully understanding customer needs, so that customers fully understand and understand product technical indicators, performance purposes, use occasions, safety precautions, etc., to help customers make the right choice.
2.Installation and training: Before the product is used, we will send professional engineers to provide you with on-site technical support, training and demonstration services.
3.Product warranty: We provide a 12-month warranty period for the product. During the warranty period, the company is responsible for compensation or free repair of equipment or accessories damage. (Except consumables and consumable parts)
4.Lifelong maintenance: We provide lifelong service to the products, for more than the warranty period of repair, maintenance only charge material fees, exempt from all labor costs.
Contact Us
| Manufacturer Full Name | WUHAN PUDI VACUUM TECHNOLOGY CO.,LTD |
| Organisational Credit Number | VA91420100MA4KN2CF2B |
| Email: | helen@pdvacuum.com ; zyw@pdvacuum.com |
| Tel: | 0086 27 81293223 |
| WECHAT/WHATSAPP: | 0086 13129990512 |
