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The system PD-200C is a small multi-target magnetron sputtering coating test platform developed by our company for laboratory applications. The system covers an area of small, easy to operate
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PD-200C
PUDI
8419899090-7
Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.
For Magnetron Sputtering Coater,the typical models including:
| Model | PD-200C | PD-300C | PD-400C | PD-500C | PD-600C | PD-450CS | PD-550CS |
| Application | Widely used in scientific research institutes and laboratories to prepare metal electrode layers, sample preparation for scanning electron microscopy, and research on new organic materials and new processes related to new energy materials. It is used in the research and development of perovskite solar cells, OLED, lithium batteries, quantum dot LED, OPV and other industries, and can prepare ITO oxide, nitride, metal and other thin film materials. At the same time, it is also suitable for multi-material research such as metals, semiconductors, nanotechnology and insulators. | ||||||
| Materials | Metal materials such as aluminum, titanium, zirconium, chromium, nickel, iron, etc. Oxide materials such as alumina, silicon oxide, titanium oxide Semiconductor materials: such as silicon, germanium, etc. | ||||||
| Device Size (L×W×H) | 500×500×600mm | 550×900×1850mm | 850×1500×1900mm | 1450×1250×1850mm | 2200×1700×2200mm | 1500×850×1900mm | 1500×850×1900mm |
| chamber Size(L×W×H) | Φ220×H340mm Cylindrical | 300×300×380mm | 400×400×380mm | 500×500×500mm | 600×600×500mm | 440×440×450mm | 500×440×450mm |
| Ultimate Vacuum | 6×10-5Pa | 7×10-5Pa | 3×10-5Pa | 3×10-5Pa | 3×10-7Pa | 5×10-5Pa | 5×10-5Pa |
| Pumping speed | 6×10-4Pa≤20min | 8×10-4Pa≤35min | 8×10-4Pa≤30min | 8×10-4Pa≤35min | 5×10-6Pa≤30min | 9×10-4Pa≤35min | 9×10-4Pa≤35min |
| Keep pressure | 12H≤8pa | 12H≤8pa | 12H≤8pa | 12H≤5pa | 12H≤5pa | 12H≤5pa | 12H≤5pa |
| Unifimity | Better than ±5％ | ||||||
| Sputter target gun | 2-3inch target gun 1pc | 2-3inch target gun 2pcs | 2-3inch target gun 3pcs | 2-3 inch target gun 4pcs | 2-3 inch target gun 4pcs | Rectangular targets L365mm x W75mm 2pcs | Rectangular targets L450mm x W75mm 2pcs |
| Substrate Size | 2-3INCH | 2-4INCH | 2-4INCH | 2-6INCH | 2-6INCH | 200×200mm | 250×250mm |
| Control system | Siemens PLC + PC automatic control; the speed and final thickness can be input, and PID adjustment automatically controls the evaporation power output. | ||||||
More About PUDI VACUUM PD-200C
| Name | Desktop Magnetron Sputtering coating equipment PD-200C |
| Vacuum coating chamber | 304 stainless steel material, cylindrical, with viewing window on the door; The net size of the coating room is about: diameter 260xH280mm. |
| Vacuum system | Mechanical pump + molecular pump (import). |
| Vacuum | Inficon (imported) full range vacuum gauge to ensure |
| measurement | measurement control accuracy. |
| Vacuum limit | Better than 3×10-5Pa to reach 3×10-4Pa≤15min. |
| Rotate the substrate table | Load the substrate with a maximum diameter of 80mm; The substrate is magnetohydrodynamic sealed, the motor drives the substrate to rotate, and the rotation speed is adjustable from 0-20 RPM. |
| Uniformity index | Non-uniformity in the 80mm diameter range "5% |
| Magnetron sputtering source | 2 inch magnetron sputtering target 2-3pcs ,1KW DC/IF/RF sputtering power supplies 1 set. |
| and power supply | |
| Air intake system | Fixed flow control, flowmeter 20sccm, can be configured with 1-3 air intake, control accuracy is better than the maximum flow +/-1%. |
| Control mode | Manual logic button control or PLC touch screen control is optional; Perfect logic program interlock protection and abnormal alarm. |
| Optional | Magnetron target/sample bench heating or water cooling/dry pump/flow meter/matching upgrade bracket/circulating water cooler. |
| Power distribution | Voltage: AC220V/50HZ Power: 2.5KW |
| Equipment size | Length x width x height :500x360x380mm |
| Manufacturer | PUDI VACUUM |
Contact Us
| Manufacturer Full Name | WUHAN PUDI VACUUM TECHNOLOGY CO.,LTD |
| Organisational Credit Number | VA91420100MA4KN2CF2B |
| Email: | helen@pdvacuum.com ; zyw@pdvacuum.com |
| Tel: | 0086 27 81293223 |
| WECHAT/WHATSAPP: | 0086 13129990512 |
Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.
For Magnetron Sputtering Coater,the typical models including:
| Model | PD-200C | PD-300C | PD-400C | PD-500C | PD-600C | PD-450CS | PD-550CS |
| Application | Widely used in scientific research institutes and laboratories to prepare metal electrode layers, sample preparation for scanning electron microscopy, and research on new organic materials and new processes related to new energy materials. It is used in the research and development of perovskite solar cells, OLED, lithium batteries, quantum dot LED, OPV and other industries, and can prepare ITO oxide, nitride, metal and other thin film materials. At the same time, it is also suitable for multi-material research such as metals, semiconductors, nanotechnology and insulators. | ||||||
| Materials | Metal materials such as aluminum, titanium, zirconium, chromium, nickel, iron, etc. Oxide materials such as alumina, silicon oxide, titanium oxide Semiconductor materials: such as silicon, germanium, etc. | ||||||
| Device Size (L×W×H) | 500×500×600mm | 550×900×1850mm | 850×1500×1900mm | 1450×1250×1850mm | 2200×1700×2200mm | 1500×850×1900mm | 1500×850×1900mm |
| chamber Size(L×W×H) | Φ220×H340mm Cylindrical | 300×300×380mm | 400×400×380mm | 500×500×500mm | 600×600×500mm | 440×440×450mm | 500×440×450mm |
| Ultimate Vacuum | 6×10-5Pa | 7×10-5Pa | 3×10-5Pa | 3×10-5Pa | 3×10-7Pa | 5×10-5Pa | 5×10-5Pa |
| Pumping speed | 6×10-4Pa≤20min | 8×10-4Pa≤35min | 8×10-4Pa≤30min | 8×10-4Pa≤35min | 5×10-6Pa≤30min | 9×10-4Pa≤35min | 9×10-4Pa≤35min |
| Keep pressure | 12H≤8pa | 12H≤8pa | 12H≤8pa | 12H≤5pa | 12H≤5pa | 12H≤5pa | 12H≤5pa |
| Unifimity | Better than ±5％ | ||||||
| Sputter target gun | 2-3inch target gun 1pc | 2-3inch target gun 2pcs | 2-3inch target gun 3pcs | 2-3 inch target gun 4pcs | 2-3 inch target gun 4pcs | Rectangular targets L365mm x W75mm 2pcs | Rectangular targets L450mm x W75mm 2pcs |
| Substrate Size | 2-3INCH | 2-4INCH | 2-4INCH | 2-6INCH | 2-6INCH | 200×200mm | 250×250mm |
| Control system | Siemens PLC + PC automatic control; the speed and final thickness can be input, and PID adjustment automatically controls the evaporation power output. | ||||||
More About PUDI VACUUM PD-200C
| Name | Desktop Magnetron Sputtering coating equipment PD-200C |
| Vacuum coating chamber | 304 stainless steel material, cylindrical, with viewing window on the door; The net size of the coating room is about: diameter 260xH280mm. |
| Vacuum system | Mechanical pump + molecular pump (import). |
| Vacuum | Inficon (imported) full range vacuum gauge to ensure |
| measurement | measurement control accuracy. |
| Vacuum limit | Better than 3×10-5Pa to reach 3×10-4Pa≤15min. |
| Rotate the substrate table | Load the substrate with a maximum diameter of 80mm; The substrate is magnetohydrodynamic sealed, the motor drives the substrate to rotate, and the rotation speed is adjustable from 0-20 RPM. |
| Uniformity index | Non-uniformity in the 80mm diameter range "5% |
| Magnetron sputtering source | 2 inch magnetron sputtering target 2-3pcs ,1KW DC/IF/RF sputtering power supplies 1 set. |
| and power supply | |
| Air intake system | Fixed flow control, flowmeter 20sccm, can be configured with 1-3 air intake, control accuracy is better than the maximum flow +/-1%. |
| Control mode | Manual logic button control or PLC touch screen control is optional; Perfect logic program interlock protection and abnormal alarm. |
| Optional | Magnetron target/sample bench heating or water cooling/dry pump/flow meter/matching upgrade bracket/circulating water cooler. |
| Power distribution | Voltage: AC220V/50HZ Power: 2.5KW |
| Equipment size | Length x width x height :500x360x380mm |
| Manufacturer | PUDI VACUUM |
Contact Us
| Manufacturer Full Name | WUHAN PUDI VACUUM TECHNOLOGY CO.,LTD |
| Organisational Credit Number | VA91420100MA4KN2CF2B |
| Email: | helen@pdvacuum.com ; zyw@pdvacuum.com |
| Tel: | 0086 27 81293223 |
| WECHAT/WHATSAPP: | 0086 13129990512 |
