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The system PD-5000C can be used for Ti, Cu, Ni and other metal film and dielectric film, oxide film of large area continuous preparation, on the production of single-sided or double-sided single-layer film and multilayer film.
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PD-5000C
PUDI
8419899090-14
Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.
More About PUDI VACUUM PD-5000C
Product Overview:
The equipment can be used for Ti, Cu, Ni and other metal film and dielectric film, oxide film of large area continuous preparation, on the production of single-sided or double-sided single-layer film and multilayer film. The system is very suitable for the preparation of high uniformity, high repeatability of film materials and industrialization.
Product Description:
The equipment is a continuous multi-chamber chamber magnetron sputtering coating system, can be used for Ti, Cu, Ni and other metal film and dielectric film, oxide film preparation, can be made on the workpiece single-sided or double-sided single-layer film and multilayer film. The overall structure of the system includes: vacuum system, cathode system, workpiece frame system, gas path system, workpiece baking system, walking and driving system, cold water system, power system, security and alarm system, PLC automatic control system, housing cover and so on.
Equipment features:
★ Compact structure design, reasonable layout; Reasonable use of space and convenient maintenance.
★ The equipment is equipped with a trolley feeding and discharging, convenient and fast, saving the coating production time.
★ Sample rack moving plus bias design, improve the bonding force of the film.
★ Double track design is stable and reliable, even in the high temperature environment of the car room transmission and movement can be stable and uniform, so as to ensure the quality of the film.
Technical indicators:
| Name | Large-Area Continuous Magnetron Sputtering Coater PD-5000C |
| Vacuum chamber (3/5units) | 2600x2200x450mm |
| Ultimate vacuum | 2.0 x10-4 Pa |
| Sampling room pumping speed | ≤15min |
| Coating non-uniformity | ± 5% (between sessions, batches) |
| Pressure stability of vacuum system | Plus or minus 3% |
| Sputtering target | 800 x 120 x 7mm 2-4 PCS choose the equipment according to actual needs |
| Target utilization rate | 35% or higher |
| Sample heating | Heating temperature ≥300℃, control accuracy ±1 degree, uniformity ±5° |
| Workpiece size | 100mm×100mm~125mm×125mm |
| Effective sputter area | 670mm×80mm, ≥240 pieces (double-sided) |
| capacity | 480 pieces (single-sided)/day |
| Manufacturer | PUDI VACUUM |
Product Overview:
The magnetron sputtering system is equipped with multiple magnetron sputtering sources that deposit metals, semiconductors, and dielectric materials on substrates up to 6 inches long for sputtering multilayer films and co-sputtering alloy films. The system can be optional automatic sampling room, comprehensive features, flexible use, suitable for research and development and small batch production requirements.
Product Description:
System using confocal sputtering or public rotation structure can be selected, workpiece size 4-6 inches. Four 3-inch pieces can be configured.
Round sputtering cathodes, or 4 2 "diameter round sputtering target guns; Optionally equipped with ion source cleaning. Can achieve DC sputtering, intermediate frequency sputtering, RF reactive sputtering, total sputtering.
Automatic sampling room can be configured, optional RF bias pre-cleaning, workpiece heating functions, comprehensive functions, flexible use, suitable for research and development and small batch production requirements.
Equipment features:
★ Integrated design fine layout, more space saving and more exquisite shape;
★ Reasonable intake design, target Angle height adjustable to ensure better uniformity.
Technical indicators:
| Name | Magnetron Sputtering Coater PD-500C |
| Vacuum chamber | Square vacuum chamber, made of 304 stainless steel, electropolished interior, vertical front door opening with a 4-inch observation window. Size:500×500×500mm |
| Automatic sampling chamber | Automatic transfer of 4-6 inch work tray |
| High vacuum pump | 1600L/S molecular pump + mechanical pump, the ultimate vacuum is better than 5E-5Pa, and the time from the atmosphere to 5E-4Pa is less than 30 minutes. |
| Sputtering Target | Four 3-inch diameter circular target guns, sputtering 4-inch workpieces, 4-inch uniformity better than +/-4%. |
| The target guns are all angular adjustable, with an adjustable tilt Angle of 0-40 degrees. | |
| Power Supply | 1KW DC power supply, power control, maximum output voltage 800V, 2-inch target gun maximum DC power 350W, 3-inch target gun maximum DC power 700W. |
| 500W RF power supply, power control, Max RF power of 200W for 2-inch target gun, Max RF power of 350W for 3-inch target gun, automatic power supply matching. | |
| Equipped with automatic switcher, one power supply can switch to | |
| Target gun | support multiple target gun workpieces. |
| Air intake control | Flowmeter flow is optional and can be configured with multiple intake. |
| Heating control | Armored heating wire heating, heating up to 600 degrees. |
| Work table | Ordinary workpiece table, heating workpiece table, water cooled workpiece table, radio frequency bias workpiece table, a variety of function combination workpiece table can be selected. |
| Control system | PLC+ PC automatic control |
| Manufacturer | PUDI VACUUM |
Contact Us
| Manufacturer Full Name | WUHAN PUDI VACUUM TECHNOLOGY CO.,LTD |
| Organisational Credit Number | VA91420100MA4KN2CF2B |
| Email: | helen@pdvacuum.com ; zyw@pdvacuum.com |
| Tel: | 0086 27 81293223 |
| WECHAT/WHATSAPP: | 0086 13129990512 |
Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.
More About PUDI VACUUM PD-5000C
Product Overview:
The equipment can be used for Ti, Cu, Ni and other metal film and dielectric film, oxide film of large area continuous preparation, on the production of single-sided or double-sided single-layer film and multilayer film. The system is very suitable for the preparation of high uniformity, high repeatability of film materials and industrialization.
Product Description:
The equipment is a continuous multi-chamber chamber magnetron sputtering coating system, can be used for Ti, Cu, Ni and other metal film and dielectric film, oxide film preparation, can be made on the workpiece single-sided or double-sided single-layer film and multilayer film. The overall structure of the system includes: vacuum system, cathode system, workpiece frame system, gas path system, workpiece baking system, walking and driving system, cold water system, power system, security and alarm system, PLC automatic control system, housing cover and so on.
Equipment features:
★ Compact structure design, reasonable layout; Reasonable use of space and convenient maintenance.
★ The equipment is equipped with a trolley feeding and discharging, convenient and fast, saving the coating production time.
★ Sample rack moving plus bias design, improve the bonding force of the film.
★ Double track design is stable and reliable, even in the high temperature environment of the car room transmission and movement can be stable and uniform, so as to ensure the quality of the film.
Technical indicators:
| Name | Large-Area Continuous Magnetron Sputtering Coater PD-5000C |
| Vacuum chamber (3/5units) | 2600x2200x450mm |
| Ultimate vacuum | 2.0 x10-4 Pa |
| Sampling room pumping speed | ≤15min |
| Coating non-uniformity | ± 5% (between sessions, batches) |
| Pressure stability of vacuum system | Plus or minus 3% |
| Sputtering target | 800 x 120 x 7mm 2-4 PCS choose the equipment according to actual needs |
| Target utilization rate | 35% or higher |
| Sample heating | Heating temperature ≥300℃, control accuracy ±1 degree, uniformity ±5° |
| Workpiece size | 100mm×100mm~125mm×125mm |
| Effective sputter area | 670mm×80mm, ≥240 pieces (double-sided) |
| capacity | 480 pieces (single-sided)/day |
| Manufacturer | PUDI VACUUM |
Product Overview:
The magnetron sputtering system is equipped with multiple magnetron sputtering sources that deposit metals, semiconductors, and dielectric materials on substrates up to 6 inches long for sputtering multilayer films and co-sputtering alloy films. The system can be optional automatic sampling room, comprehensive features, flexible use, suitable for research and development and small batch production requirements.
Product Description:
System using confocal sputtering or public rotation structure can be selected, workpiece size 4-6 inches. Four 3-inch pieces can be configured.
Round sputtering cathodes, or 4 2 "diameter round sputtering target guns; Optionally equipped with ion source cleaning. Can achieve DC sputtering, intermediate frequency sputtering, RF reactive sputtering, total sputtering.
Automatic sampling room can be configured, optional RF bias pre-cleaning, workpiece heating functions, comprehensive functions, flexible use, suitable for research and development and small batch production requirements.
Equipment features:
★ Integrated design fine layout, more space saving and more exquisite shape;
★ Reasonable intake design, target Angle height adjustable to ensure better uniformity.
Technical indicators:
| Name | Magnetron Sputtering Coater PD-500C |
| Vacuum chamber | Square vacuum chamber, made of 304 stainless steel, electropolished interior, vertical front door opening with a 4-inch observation window. Size:500×500×500mm |
| Automatic sampling chamber | Automatic transfer of 4-6 inch work tray |
| High vacuum pump | 1600L/S molecular pump + mechanical pump, the ultimate vacuum is better than 5E-5Pa, and the time from the atmosphere to 5E-4Pa is less than 30 minutes. |
| Sputtering Target | Four 3-inch diameter circular target guns, sputtering 4-inch workpieces, 4-inch uniformity better than +/-4%. |
| The target guns are all angular adjustable, with an adjustable tilt Angle of 0-40 degrees. | |
| Power Supply | 1KW DC power supply, power control, maximum output voltage 800V, 2-inch target gun maximum DC power 350W, 3-inch target gun maximum DC power 700W. |
| 500W RF power supply, power control, Max RF power of 200W for 2-inch target gun, Max RF power of 350W for 3-inch target gun, automatic power supply matching. | |
| Equipped with automatic switcher, one power supply can switch to | |
| Target gun | support multiple target gun workpieces. |
| Air intake control | Flowmeter flow is optional and can be configured with multiple intake. |
| Heating control | Armored heating wire heating, heating up to 600 degrees. |
| Work table | Ordinary workpiece table, heating workpiece table, water cooled workpiece table, radio frequency bias workpiece table, a variety of function combination workpiece table can be selected. |
| Control system | PLC+ PC automatic control |
| Manufacturer | PUDI VACUUM |
Contact Us
| Manufacturer Full Name | WUHAN PUDI VACUUM TECHNOLOGY CO.,LTD |
| Organisational Credit Number | VA91420100MA4KN2CF2B |
| Email: | helen@pdvacuum.com ; zyw@pdvacuum.com |
| Tel: | 0086 27 81293223 |
| WECHAT/WHATSAPP: | 0086 13129990512 |
