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The system PD-600C using confocal sputtering or public rotation structure can be selected, workpiece size 4-6 inches. Four 3-inch pieces can be configured.Support customized system.
| Quantity: | |
|---|---|
PD-600C
PUDI
8419899090-13
Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.
For Magnetrn Sputtering Coater,the typical models including:
| Model | PD-200C | PD-300C | PD-400C | PD-500C | PD-600C | PD-450CS | PD-550CS |
| Application | Widely used in scientific research institutes and laboratories to prepare metal electrode layers, sample preparation for scanning electron microscopy, and research on new organic materials and new processes related to new energy materials. It is used in the research and development of perovskite solar cells, OLED, lithium batteries, quantum dot LED, OPV and other industries, and can prepare ITO oxide, nitride, metal and other thin film materials. At the same time, it is also suitable for multi-material research such as metals, semiconductors, nanotechnology and insulators. | ||||||
| Materials | Metal materials such as aluminum, titanium, zirconium, chromium, nickel, iron, etc. Oxide materials such as alumina, silicon oxide, titanium oxide Semiconductor materials: such as silicon, germanium, etc. | ||||||
| Device Size (L×W×H) | 500×500×600mm | 550×900×1850mm | 850×1500×1900mm | 1450×1250×1850mm | 2200×1700×2200mm | 1500×850×1900mm | 1500×850×1900mm |
| chamber Size(L×W×H) | Φ220×H340mm Cylindrical | 300×300×380mm | 400×400×380mm | 500×500×500mm | 600×600×500mm | 440×440×450mm | 500×440×450mm |
| Ultimate Vacuum | 6×10-5Pa | 7×10-5Pa | 3×10-5Pa | 3×10-5Pa | 3×10-7Pa | 5×10-5Pa | 5×10-5Pa |
| Pumping speed | 6×10-4Pa≤20min | 8×10-4Pa≤35min | 8×10-4Pa≤30min | 8×10-4Pa≤35min | 5×10-6Pa≤30min | 9×10-4Pa≤35min | 9×10-4Pa≤35min |
| Keep pressure | 12H≤8pa | 12H≤8pa | 12H≤8pa | 12H≤5pa | 12H≤5pa | 12H≤5pa | 12H≤5pa |
| Unifimity | Better than ±5％ | ||||||
| Sputter target gun | 2-3inch target gun 1pc | 2-3inch target gun 2pcs | 2-3inch target gun 3pcs | 2-3 inch target gun 4pcs | 2-3 inch target gun 4pcs | Rectangular targets L365mm x W75mm 2pcs | Rectangular targets L450mm x W75mm 2pcs |
| Substrate Size | 2-3INCH | 2-4INCH | 2-4INCH | 2-6INCH | 2-6INCH | 200×200mm | 250×250mm |
| Control system | Siemens PLC + PC automatic control; the speed and final thickness can be input, and PID adjustment automatically controls the evaporation power output. | ||||||
More About PUDI VACUUM PD-600C
Product Overview:
The magnetron sputtering system is equipped with multiple magnetron sputtering sources that deposit metals, semiconductors, and dielectric materials on substrates up to 6 inches long for sputtering multilayer films and co-sputtering alloy films. The system can be optional automatic sampling room, comprehensive features, flexible use, suitable for research and development and small batch production requirements.
Product Description:
System using confocal sputtering or public rotation structure can be selected, workpiece size 4-6 inches. Four 3-inch pieces can be configured.
Round sputtering cathodes, or 4 2 "diameter round sputtering target guns; Optionally equipped with ion source cleaning. Can achieve DC sputtering, intermediate frequency sputtering, RF reactive sputtering, total sputtering.
Automatic sampling room can be configured, optional RF bias pre-cleaning, workpiece heating functions, comprehensive functions, flexible use, suitable for research and development and small batch production requirements.
Equipment features:
★ Integrated design fine layout, more space saving and more exquisite shape;
★ Reasonable intake design, target Angle height adjustable to ensure better uniformity.
★ Confocal sputtering or public rotation structure can be optionally equipped with ion source cleaning function and bias pre-cleaning
★ 4pcs 2-4 inch magnetron sputtering targets can sputter 2-8 inch silicon wafers. The uniformity within 8 inches of the tray is better than ±3%~±5%
Technical indicators:
| Name | Magnetron Sputtering Coater PD-600C with Load Lock Chamber |
| Vacuum chamber | Square vacuum chamber, made of 304 stainless steel, electropolished interior, vertical front door opening with a 4-inch observation window. Size:600×600×500mm |
| Automatic sampling chamber | Automatic transfer of 4-6 inch work tray |
| High vacuum pump | 1600L/S molecular pump + mechanical pump, the ultimate vacuum is better than 5E-5Pa, and the time from the atmosphere to 5E-4Pa is less than 30 minutes. |
| Sputtering Target | Four 3-inch diameter circular target guns, sputtering 4-inch workpieces, 4-inch uniformity better than +/-4%. |
| The target guns are all angular adjustable, with an adjustable tilt Angle of 0-40 degrees. | |
| Power Supply | 1KW DC power supply, power control, maximum output voltage 800V, 2-inch target gun maximum DC power 350W, 3-inch target gun maximum DC power 700W. |
| 500W RF power supply, power control, Max RF power of 200W for 2-inch target gun, Max RF power of 350W for 3-inch target gun, automatic power supply matching. | |
| Equipped with automatic switcher, one power supply can switch to | |
| Target gun | support multiple target gun workpieces. |
| Air intake control | Flowmeter flow is optional and can be configured with multiple intake. |
| Heating control | Armored heating wire heating, heating up to 600 degrees. |
| Work table | Ordinary workpiece table, heating workpiece table, water cooled workpiece table, radio frequency bias workpiece table, a variety of function combination workpiece table can be selected. |
| Control system | PLC+ PC automatic control |
| Manufacturer | PUDI VACUUM |
Contact Us
| Manufacturer Full Name | WUHAN PUDI VACUUM TECHNOLOGY CO.,LTD |
| Organisational Credit Number | VA91420100MA4KN2CF2B |
| Email: | helen@pdvacuum.com ; zyw@pdvacuum.com |
| Tel: | 0086 27 81293223 |
| WECHAT/WHATSAPP: | 0086 13129990512 |
Wuhan Pudi Vacuum Technology Co., Ltd is a professional designer and manufacturer of high-quality tailor-made thin film deposition Systems,core team with 22 years of experience in in the fields of machinery, electronics, materials, vacuum, etc. Our research and development team,mainly from academic scientists and qualified engineers,helpfully supports and advises customers in choosing the proper system for their speical needs,equipment installation and training,and steady and fast after-sales services.
For Magnetrn Sputtering Coater,the typical models including:
| Model | PD-200C | PD-300C | PD-400C | PD-500C | PD-600C | PD-450CS | PD-550CS |
| Application | Widely used in scientific research institutes and laboratories to prepare metal electrode layers, sample preparation for scanning electron microscopy, and research on new organic materials and new processes related to new energy materials. It is used in the research and development of perovskite solar cells, OLED, lithium batteries, quantum dot LED, OPV and other industries, and can prepare ITO oxide, nitride, metal and other thin film materials. At the same time, it is also suitable for multi-material research such as metals, semiconductors, nanotechnology and insulators. | ||||||
| Materials | Metal materials such as aluminum, titanium, zirconium, chromium, nickel, iron, etc. Oxide materials such as alumina, silicon oxide, titanium oxide Semiconductor materials: such as silicon, germanium, etc. | ||||||
| Device Size (L×W×H) | 500×500×600mm | 550×900×1850mm | 850×1500×1900mm | 1450×1250×1850mm | 2200×1700×2200mm | 1500×850×1900mm | 1500×850×1900mm |
| chamber Size(L×W×H) | Φ220×H340mm Cylindrical | 300×300×380mm | 400×400×380mm | 500×500×500mm | 600×600×500mm | 440×440×450mm | 500×440×450mm |
| Ultimate Vacuum | 6×10-5Pa | 7×10-5Pa | 3×10-5Pa | 3×10-5Pa | 3×10-7Pa | 5×10-5Pa | 5×10-5Pa |
| Pumping speed | 6×10-4Pa≤20min | 8×10-4Pa≤35min | 8×10-4Pa≤30min | 8×10-4Pa≤35min | 5×10-6Pa≤30min | 9×10-4Pa≤35min | 9×10-4Pa≤35min |
| Keep pressure | 12H≤8pa | 12H≤8pa | 12H≤8pa | 12H≤5pa | 12H≤5pa | 12H≤5pa | 12H≤5pa |
| Unifimity | Better than ±5％ | ||||||
| Sputter target gun | 2-3inch target gun 1pc | 2-3inch target gun 2pcs | 2-3inch target gun 3pcs | 2-3 inch target gun 4pcs | 2-3 inch target gun 4pcs | Rectangular targets L365mm x W75mm 2pcs | Rectangular targets L450mm x W75mm 2pcs |
| Substrate Size | 2-3INCH | 2-4INCH | 2-4INCH | 2-6INCH | 2-6INCH | 200×200mm | 250×250mm |
| Control system | Siemens PLC + PC automatic control; the speed and final thickness can be input, and PID adjustment automatically controls the evaporation power output. | ||||||
More About PUDI VACUUM PD-600C
Product Overview:
The magnetron sputtering system is equipped with multiple magnetron sputtering sources that deposit metals, semiconductors, and dielectric materials on substrates up to 6 inches long for sputtering multilayer films and co-sputtering alloy films. The system can be optional automatic sampling room, comprehensive features, flexible use, suitable for research and development and small batch production requirements.
Product Description:
System using confocal sputtering or public rotation structure can be selected, workpiece size 4-6 inches. Four 3-inch pieces can be configured.
Round sputtering cathodes, or 4 2 "diameter round sputtering target guns; Optionally equipped with ion source cleaning. Can achieve DC sputtering, intermediate frequency sputtering, RF reactive sputtering, total sputtering.
Automatic sampling room can be configured, optional RF bias pre-cleaning, workpiece heating functions, comprehensive functions, flexible use, suitable for research and development and small batch production requirements.
Equipment features:
★ Integrated design fine layout, more space saving and more exquisite shape;
★ Reasonable intake design, target Angle height adjustable to ensure better uniformity.
★ Confocal sputtering or public rotation structure can be optionally equipped with ion source cleaning function and bias pre-cleaning
★ 4pcs 2-4 inch magnetron sputtering targets can sputter 2-8 inch silicon wafers. The uniformity within 8 inches of the tray is better than ±3%~±5%
Technical indicators:
| Name | Magnetron Sputtering Coater PD-600C with Load Lock Chamber |
| Vacuum chamber | Square vacuum chamber, made of 304 stainless steel, electropolished interior, vertical front door opening with a 4-inch observation window. Size:600×600×500mm |
| Automatic sampling chamber | Automatic transfer of 4-6 inch work tray |
| High vacuum pump | 1600L/S molecular pump + mechanical pump, the ultimate vacuum is better than 5E-5Pa, and the time from the atmosphere to 5E-4Pa is less than 30 minutes. |
| Sputtering Target | Four 3-inch diameter circular target guns, sputtering 4-inch workpieces, 4-inch uniformity better than +/-4%. |
| The target guns are all angular adjustable, with an adjustable tilt Angle of 0-40 degrees. | |
| Power Supply | 1KW DC power supply, power control, maximum output voltage 800V, 2-inch target gun maximum DC power 350W, 3-inch target gun maximum DC power 700W. |
| 500W RF power supply, power control, Max RF power of 200W for 2-inch target gun, Max RF power of 350W for 3-inch target gun, automatic power supply matching. | |
| Equipped with automatic switcher, one power supply can switch to | |
| Target gun | support multiple target gun workpieces. |
| Air intake control | Flowmeter flow is optional and can be configured with multiple intake. |
| Heating control | Armored heating wire heating, heating up to 600 degrees. |
| Work table | Ordinary workpiece table, heating workpiece table, water cooled workpiece table, radio frequency bias workpiece table, a variety of function combination workpiece table can be selected. |
| Control system | PLC+ PC automatic control |
| Manufacturer | PUDI VACUUM |
Contact Us
| Manufacturer Full Name | WUHAN PUDI VACUUM TECHNOLOGY CO.,LTD |
| Organisational Credit Number | VA91420100MA4KN2CF2B |
| Email: | helen@pdvacuum.com ; zyw@pdvacuum.com |
| Tel: | 0086 27 81293223 |
| WECHAT/WHATSAPP: | 0086 13129990512 |
